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References

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Lee K.-S., Park J.-Y., Jun. 2021, Inner Spacer Engineering to Improve Mechanical Stability in Channel-Release Process of Nanosheet FETs, Electronics, Vol. 10, No. 12, pp. 1395DOI
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Jung W.-J., Park J.-Y., Oct. 2021, Dielectric Engineering to Suppress Cell-to-Cell Programming Voltage Interference in 3D NAND Flash Memory, Micromachines, Vol. 12, No. 11, pp. 1297DOI
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Park J.-Y., Moon D.-I., Seol M.-L., Kim C.-K., Jeon C.-H., H.-Bae , Bang T., Choi Y.-K., Mar. 2016, Self-curable gate-all-around MOSFETs using electrical annealing to repair degradation induced from hot-carrier injection, IEEE Trans. Electron Devices, Vol. 63, No. 3, pp. 910-915DOI
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Jung D.-H., Lee K.-S., Park J.-Y., Oct. 2021, Demonstration of Multi-layered Macaroni Filler for Back-Biasing-Assisted Erasing Configuration in 3D V-NAND, J. Semicond. Technol. Sci., Vol. 21, No. 5DOI