Lin S., Chu H. S., 2000, Thermal uniformity of 12-in silicon wafer during rapid thermal processing by inverse heat transfer method, IEEE Transactions on Semiconductor Manufacturing, Vol. 13, No. 4, pp. 448-456

Vandenabeele P., Maex K., De Keersmaecker R., 1 1989, Impact of patterned layers on temperature non-uniformity during rapid thermal processing for vlsi-applications, in Symposium B Rapid Thermal Annealing/Chemical Vapor Deposition and Integrated Processing, ser. MRS Proceedings, Vol. 146

Lee K. S., Lee J., Chin I., Choi J., Lee J. H., 2001, Control of wafer temperature uniformity in rapid thermal processing using an optimal iterative learning control technique, Industrial & Engineering Chemistry Research, Vol. 40, No. 7, pp. 1661-1672

Gyurcsik R. S., Riley T. J., Sorrell F. Y., 1991, A model for rapid thermal-processing - achieving uniformity through lamp control, IEEE Transactions on Semiconductor Manufacturing, Vol. 4, No. 1, pp. 9-13

Chatterjee S., Trachtenberg I., Edgar T. F., 1992, Mathematical-modeling of a single-wafer rapid thermal reactor, Journal of the Electrochemical Society, Vol. 139, No. 12, pp. 3682-3689

Lord H. A., 1988, Thermal and stress analysis of semiconductor wafers in a rapid thermal processing oven, IEEE Transactions on Semiconductor Manufacturing, Vol. 1, No. 3, pp. 105-114

Kakoschke R., Bussmann E., Foll H., 1990, Modeling of wafer heating during rapid thermal-processing, Applied Physics a-Materials Science & Processing, Vol. 50, No. 2, pp. 141-150

Cho W., Edgar T. F., Lee J., 2008, Nonlinear model identification for temperature control in single wafer rapid thermal processing, Industrial & Engineering Chemistry Research, Vol. 47, No. 14, pp. 4791-4796

Kakoschek R., BuMann E., 1 1989, Simulation of temperature effects during rapid thermal processing, in Symposium B Rapid Thermal Annealing/Chemical Vapor Deposition and Integrated Processing, ser. MRS Proceedings, Vol. 146

Apte P. P., Saraswat K. C., Aug 1992, Rapid thermal processing uniformity using multivariable control of a circularly symmetric 3 zone lamp, IEEE Transactions on Semiconductor Manufacturing, Vol. 5, No. 3, pp. 180-188

lin C.-A., Jan Y.-K., Jan 2001, Control system design for a rapid thermal processing system, IEEE Transactions on Control Systems Technology, Vol. 9, No. 1, pp. 122-129

Jeng J.-C., Chen W.-C., 2013, Control strategies for thermal budget and temperature uniformity in spike rapid thermal processing systems, Computers & Chemical Engineering, Vol. 57, pp. 141-150

Xiao T., Li H. X., Nov 2014, Spectrum-based model reduction of rapid thermal processing system, in 2014 CACS International Automatic Control Conference (CACS 2014), pp. 249-253

Dassau E., Grosman B., Lewin D. R., Modeling and temperature control of rapid thermal processing, Computers & Chemical Engineering, Vol. 30, No. 4, pp. 686-697