I. INTRODUCTION
With the increasing maturity of integrated circuit technology, the proportion of analog
circuits in design is also growing. However, most of today's electronic design automation
(EDA) tools are developed based on digital system design and do not fully account
for characteristics such as parasitic parameters and parasitic effects in analog circuits.
As a result, they fail to effectively meet the design requirements of analog circuits
and struggle to achieve high-precision matching in analog circuit layouts. Moreover,
as circuit scale continues to expand, the time cost of analog circuit layout design
is also rising. Therefore, the development of EDA technology for analog circuits is
both urgent and crucial for analog circuit design.
At the same time, with the continuous development of the electronic information field,
digital signals and their processing methods are becoming increasingly prevalent in
modern communications. However, most signals in the real world are analog. As the
bridge between the real and digital worlds, the analog-to-digital converter (ADC)
is an essential component of signal acquisition systems. The Successive Approximation
Register (SAR) ADC features a high degree of digitization, and it is highly compatible
with advanced nanoscale semiconductor processes. Additionally, this type of ADC offers
advantages such as low power consumption, moderate sampling speed, and moderate precision
[1], making it one of the most widely used ADC architectures today.
SAR ADCs typically utilize a capacitor-based Digital-to-Analog Converter (DAC) to
sample and quantize input signals. Traditional SAR ADC structures perform well in
applications requiring precision below 12 bits. However, as precision requirements
increase, nonlinearity errors caused by capacitor array mismatches become a critical
non-ideal factor, surpassing the impact of sampling noise from the capacitor array
on overall accuracy. Moreover, the area of the Capacitive DAC (CDAC) array expands
significantly as precision requirements rise. Therefore, the rationality of capacitor
array placement and routing plays a crucial role in determining the overall performance
of SAR ADCs.
1. Previous Work
In 1979, G. L. Baldwin and J. L. McCreary first utilized a binary-weighted matched
capacitor array along with an operational amplifier to form a capacitive voltage divider
network, achieving precise attenuation [2]. In 2017, Nai-Chen Chen et al. proposed a novel Metal-Oxide-Metal (MOM) capacitor
structure, which offered advantages such as high capacitance density and low parasitic
capacitance compared to all other capacitor structures. Based on the MOM capacitor,
they further introduced a capacitor sizing and interconnect parasitic matching method
based on integer linear programming [3]. In 2021, Keun-Yong Chung, Kwang-Hyun Baek, and Bo-Kyong Choi proposed that parasitic
capacitance from top to bottom would reduce the linearity of SAR ADCs, and designed
two customized routing capacitors to reduce parasitic effects between capacitor arrays
[4]. In 2024, Zheng-Han Chen and colleagues proposed a novel capacitor layout structure
that bottom plate wraps top plate except the upper surface, effectively reducing the
parasitic capacitance of the sub-CDAC top plate [5]. In the same year, Sewon Lee and colleagues proposed a grounded-finger CDAC that
employs a regularized structure with symmetrical top plates on both sides to mitigate
the impact of non-scalable edge capacitance [6]. Based on the above research, this article designs a symmetrical MOM capacitor with
a bottom plate wrapped around a top plate for experimental purposes.
In order to cope with parasitic effects introduced by wiring, layout technology is
crucial, and as design complexity increases, automated layout tools become necessary.
In 2013, Mark Po-Hung Lin et al. proposed the Pair-Sequence placement method to effectively
reduce parasitic effects caused by interconnect lines in capacitor array layouts [7]. In 2016, Florin Burcea et al. proposed a new chessboard placement method for capacitor
arrays by minimizing the variance of differential nonlinearity (DNL) [8]. In 2020, Ye X. Ding et al. proposed a hybrid placement combining chessboard and
grouped placements, taking into account the complexity of capacitor routing and the
generalized nonlinear model [9]. In 2021, Mingjie Liu and colleagues introduced OpenSAR, the first open-source automated
end-to-end SAR ADC compiler. This compiler utilizes a template-based layout generator
that arranges the LSB and MSB sections of the capacitor array in interleaved rows
and columns, respectively [10]. In the same year, Jaeduk Han and colleagues implemented on-grid placement and routing
using LAYGO, a Python-based layout-generation engine, which showcased the potential
of scripting processes [11]. In 2022 and 2023, Yao-Hung Tsai and Shen-Iuan Liu introduced digital place-and-route
(DPR) tools to complete the layout of SAR ADCs [12,13]. In 2023, Nibedita Karmokar et al. first proposed a model to balance linearity metrics
and the 3-dB frequency of binary-weighted DACs. They also introduced two different
placements: the spiral placement and the BC placement [14]. In 2024, Costas Laoudias and his team ensured good linearity in their capacitor
array design by separately laying out the MSB and LSB arrays. They positioned the
split capacitors between these two arrays, significantly reducing the area occupied
by the CDAC [15].
References [5,7-9,14] all aim to minimize matching errors and parasitic coupling through specific unit
arrangement rules. [15]'s partition layout focuses on optimizing area and key position matching. These methods
demonstrate the decisive impact of intelligent layout on CDAC performance, but they
typically exist as independent design rules or manual optimization steps. Based on
the above research and the customized capacitor structure proposed in this article,
a grouping based staggered arrangement scheme between columns is adopted. [10-13] represents a significant progress towards automated and efficient design, demonstrating
the feasibility of automated design of capacitor arrays. Based on this, this article
designs an automated layout generation strategy based on staggered arrangement between
columns, which is highly regular in layout and has a simple and efficient algorithm.
The ultimate simplicity and automation friendliness, while ensuring good performance,
are the main advantages and differences of this solution compared to more complex
strategies [10-13] in terms of automation implementation.
2. Our Contributions
This paper implements an automatic generation method for high-matching capacitor array
layouts based on EDA technology. It includes a complete automatic layout design process
and its algorithms. For CDAC layout designs with 12-bit precision or below, the layout
generation time is reduced to the level of seconds. In CDAC designs with 8 to 13 bits,
the effective number of DAC bits (ENOB) can approach the ideal value. This method
significantly shortens the design cycle and improves work efficiency while achieving
high-precision layout generation. With the assistance of EDA technology, designers
can quickly complete complex CDAC layout designs, reduce manual operation time, and
minimize parasitic effects and delays caused by human errors or intuitive experience.
In the next section, we will introduce the unit capacitor used and analyze the circuit
model of the CDAC array after parasitic extraction. In the third section, we will
present the implementation of the CDAC placement algorithm. In the fourth section,
we will demonstrate the detailed routing method for the capacitor array. In the fifth
section, we will showcase the experimental results of the automatic layout generation.
Finally, in the sixth section, we will summarize our work and discuss potential improvements
for the layout.
II. UNIT CAPACITOR AND ARRAY INTERCONNECTION PARASITIC ANALYSIS
1. Capacitor Structure
The process used in this article is TSMCN65, and the MIM capacitor shape of this process
is polygonal, which is not conducive to the design of automatic layout and routing
tools, and its structure is easily affected by external environment. Therefore, this
paper uses custom MOM capacitors as the unit capacitors for designing the CDAC array.
MOM capacitors are capacitors realized through multi-layer metal interconnection structures.
Typically, they adopt a finger-like structure, where metal wires of the same layer
are arranged in parallel, and the capacitive coupling is enhanced by sidewall coupling.
A typical design of MOM capacitors involves vertical stacking, with vias connecting
different metal layers, utilizing the overlapping area between layers to form capacitance.
A schematic diagram of the MOM capacitor structure is shown in Fig. 2.
Fig. 1. The MIM capacitor of TSMCN65.
Fig. 2. The schematic diagram of the MOM capacitor structure {[16].
MOM capacitors can be directly fabricated using the metal layers and oxide dielectric
materials from standard CMOS processes, without the need for additional masks. This
makes the manufacturing process simpler and more cost-effective, and easier to produce,
ultimately reducing production costs [16]. In addition, MOM capacitors offer several advantages, including high matching accuracy,
low parasitic parameters, and excellent stability with respect to temperature and
voltage. These characteristics make MOM capacitors ideal for precision applications
such as CDACs, where accurate capacitance values and reliable performance under varying
conditions are crucial.
Process variations, such as lithography misalignment and etching non-uniformities,
typically exhibit a gradient characteristic in space (e.g., metal lines on the left
side tend to be wider, while those on the right side tend to be narrower). To address
these variations, MOM capacitors can be designed using a co-centric symmetric placement.
This design ensures that each capacitor unit is distributed across different spatial
positions, helping to average out local deviations. As a result, the ratio of adjacent
capacitors can closely approach the ideal value. This capability to minimize local
process variations and maintain high matching accuracy is a key advantage that makes
MOM capacitors irreplaceable in high-precision SAR ADCs.
One of the main sources of noise in SAR ADC circuits is sampling noise. The magnitude
of sampling noise is inversely proportional to the capacitance value, meaning that
increasing the capacitance value can significantly reduce the noise amplitude and
improve the signal-to-noise ratio (SNR). Larger capacitors are less affected by process
fluctuations during manufacturing, leading to a smaller impact on the overall capacitance
value. This results in improved matching of the capacitor array, reducing nonlinear
errors and ensuring higher accuracy in the output analog signal.The parasitic capacitance
in a CDAC is typically in parallel with the designed capacitance. If a larger unit
capacitor is chosen, the proportion of parasitic capacitance becomes smaller, reducing
its impact on the capacitance ratio. Therefore, using larger capacitors in CDACs offers
advantages such as improved accuracy, reduced noise, and enhanced immunity to interference,
making them particularly suitable for applications with strict requirements for signal-to-noise
ratio (SNR) and linearity. Although this may sacrifice some speed and area, with proper
design, these limitations can be partially mitigated, allowing for high-performance
digital-to-analog conversion.In CDAC design, a unit capacitance of typically 5.05
fF is used to ensure low power consumption [17]. After comprehensive consideration, this paper simulates using a MOM capacitor with
a capacitance value of 9.978 fF. The linearity of a capacitor array directly depends
on the matching accuracy of the unit capacitance, and the relative error (rather than
absolute error) of all capacitor units in the array must be extremely small. This
paper uses Metal6 (M6) as the top and bottom plate metals for the capacitor, while
Metal5 and Metal7 form two large plates that surround the top plate metal and connect
to the bottom plate metal through vias. This structure of the bottom plate enclosing
the top plate uses the bottom plate as an electrostatic shielding layer, so that the
electric field lines of the top plate terminate at the bottom plate. Therefore, the
parasitic capacitance of the top plate of the capacitor is only left with the expected
parasitic coupling between the bottom plate, and the parasitic capacitance affected
by the external environment is greatly suppressed, thereby ensuring that the parasitic
capacitance error of all capacitors is sufficiently small. The specific layout structure
is shown in Fig. 3, and the detailed structure of the unit capacitor from a 3D perspective is shown
in Fig. 4.
Fig. 3. MOM capacitor layout and its physical dimensions.
Fig. 4. Structure of the unit capacitor (3D capacitor).
Table 1. Comparison of capacitance performance with different capacitance values.
|
RES
|
5.12f
|
9.978f
|
|
ENOB
|
DNL
|
INL
|
ENOB
|
DNL
|
INL
|
|
8bits
|
7.961
|
0.042
|
0.043
|
7.968
|
0.024
|
0.031
|
|
9bits
|
8.951
|
0.031
|
0.043
|
8.958
|
0.046
|
0.043
|
|
10bits
|
9.899
|
0.079
|
0.089
|
9.911
|
0.148
|
0.110
|
|
11bits
|
10.960
|
0.35
|
0.38
|
10.965
|
0.283
|
0.227
|
|
12bits
|
11.941
|
0.501
|
0.331
|
11.952
|
0.436
|
0.316
|
|
13bits
|
12.952
|
0.934
|
1.026
|
12.969
|
0.811
|
0.830
|
This article uses a unit capacitance of 10fF mainly due to laboratory simulation experience,
hoping to effectively reduce random mismatches by increasing the capacitance area.
And from the data in the table, it can also be seen that CDAC based on 10fF unit capacitance
has better performance in terms of linearity.
2. Parasitic Analysis of CDAC Array Interconnects
According to [18], in a capacitor array, in addition to the designed capacitance values, there are
typically some unavoidable parasitic capacitances that may affect the matching, linearity,
and overall performance of the array. There are mainly four types: the parasitic capacitance
between the capacitor top plate and the substrate C${}_{\rm TS}$, the parasitic capacitance
between the capacitor bottom plate and the substrate C${}_{\rm BS}$, the mutual coupling
capacitance between adjacent capacitors C${}_{\rm BB}$, and the additional parasitic
capacitance between the capacitor top plate and bottom plate C${}_{\rm TB}$. Taking
a 4-bit single-ended capacitive SAR ADC as an example, the equivalent circuit of its
CDAC array after parasitic extraction is shown in Fig. 5.
Fig. 5. The equivalent 4-bit SAR ADC circuit after post-layout parasitic extraction.
The performance of a CDAC is closely related to the accuracy of the capacitance ratios
in the binary-weighted capacitor array. The precision of these capacitance ratios
depends on the matching characteristics of the capacitor array placement and the inductive
parasitic effects between the interconnect lines [18]. The matching characteristics of the capacitor array placement require the CDAC capacitors
to use a highly symmetric co-centroid placement. The inductive parasitics between
the interconnect lines primarily affect the accuracy of the CDAC, especially the parasitic
capacitance between the top plate and the bottom plate, as well as the parasitic capacitance
between the top plate and the substrate [19]. A rational placement of the array is necessary to ensure that these two parasitics
are in accordance with the capacitance ratio.
In this paper, unit capacitors are designed by splitting a single capacitor in the
CDAC into multiple unit capacitors. The number of unit capacitors in the array corresponds
to the capacitance ratio in the CDAC, ensuring high matching of the parasitic capacitance
between each capacitor's top plate and the substrate. To reduce the parasitic capacitance
coupling between the bottom plate interconnects and the top plate, the unit capacitors
in this design adopt a structure where the bottom plate surrounds the top plate. The
bottom plate routing is done under the capacitor's bottom layer, ensuring a more compact
and uniform capacitor array. However, this structure increases the parasitic coupling
between adjacent bottom plates. Therefore, the parasitic capacitance between the top
plate and the bottom plate may also be influenced by the parasitic capacitance between
the adjacent bottom plates.
The MOM capacitors used in this paper have a small parasitic contribution between
the bottom plates of adjacent capacitors in the vertical direction, and under design
rule check (DRC) distances, they have no significant impact. Therefore, the parasitic
capacitance between adjacent capacitor bottom plates mainly occurs in the horizontal
direction. When the adjacent capacitors belong to different bits, their bottom plates
are connected to different inputs, both of which are strong sources. As a result,
the parasitic capacitance between the bottom plates of the two capacitors does not
affect the design. However, when the adjacent capacitors belong to the same bit, the
parasitic effect between their bottom plates cannot be ignored. This is equivalent
to adding a small capacitor in series in the original circuit, which reduces the parasitic
capacitance between the bit's capacitor and the top plate. Therefore, the placement
in this paper mainly focuses on the adjacent capacitors within the same bit in the
horizontal direction to control the total parasitic capacitance between each bit's
capacitor and the top plate, ensuring it is close to the capacitance ratio.
III. IMPLEMENTATION OF CDAC PLACEMENT ALGORITHM
In the previous section, this paper has analyzed the factors affecting the accuracy
of CDAC. It is required that the capacitor array placement must satisfy the co-centroid
arrangement, while also paying attention to the parasitic coupling between adjacent
capacitors, ensuring that the parasitic capacitance of each bit's capacitor to the
top plate is well-matched.
When capacitors of the same bit are adjacent, the parasitic capacitance between the
bottom plates causes a slight reduction in the parasitic capacitance between the bit
capacitor and the top plate. For higher-bit SAR ADCs, the number of unit capacitors
derived from the low-bit capacitors is smaller, and even if some low-bit unit capacitors
are placed adjacent to each other, the change in the parasitic capacitance between
them and the top plate is minimal, having a relatively small impact on the linearity
of the CDAC. However, for high-bit unit capacitors, which are numerous, if they are
stacked in groups, even small parasitic changes can accumulate, resulting in significant
errors and causing severe mismatching between the capacitors.
Furthermore, as analyzed in the previous section, the parasitic effects between adjacent
capacitors in the vertical direction do not affect the accuracy. Therefore, this paper
concentrates the low-bit unit capacitors in the two central columns and arranges them
from the center to the edges, ensuring the co-centroid arrangement while minimizing
adjacent placements of the same bit capacitors. Since the number of highest-bit unit
capacitors is equal to the sum of the remaining bit capacitors, the high-bit capacitors
are arranged by columns, with the highest-bit capacitors staggered with the remaining
bit capacitors in a column-wise manner. This satisfies the symmetric design of the
co-centroid arrangement and ensures that high-bit capacitors are adjacent to capacitors
from different bit groups in the horizontal direction.
When the capacitor array adopts a square layout, the parasitic capacitance and resistance
between the capacitor units are more symmetric, reducing mismatching and non-uniform
effects. Due to the central symmetry of the square structure, manufacturing process
errors will affect all capacitor units more uniformly, which helps to improve matching
accuracy. With the same number of unit capacitors, the square placement can more effectively
fill the silicon area, reduce space wastage, and improve chip utilization. This paper
implements an automatic generation method for capacitor array placement, which automatically
calculates the array size when the number of capacitor array bits is given, and prioritizes
the generation of a square placement unless otherwise specified.
During the chip manufacturing process, processes such as photolithography, etching,
and deposition can cause non-uniform effects at the edges of the capacitor array,
leading to capacitance value deviations in the edge unit capacitors. Additionally,
the inconsistent environment around the edge unit capacitors can also affect the matching
between capacitors. By adding DUMMY capacitors around the perimeter of the capacitor
array, the impact of some noise on capacitor performance can be effectively reduced,
and the capacitance value deviation caused by edge effects can be minimized. This
ensures a consistent environment for all unit capacitors, thereby improving the linearity
and accuracy of the converter.
Taking an 8-bit binary-weighted CDAC as an example, the specific placement diagram
is shown in Fig. 6. The symbols in the figure are explained as follows: D represents a virtual capacitor
(Dummy), and each number corresponds to a unit capacitor for the corresponding bit.
The numbers 0-7 correspond to capacitors C0-C7, with the bit capacitor values being
1, 2, 4, 8, 16, 32, 64, and 128, respectively. Since the number of C0 capacitors is
1, and the total number of capacitors in a two-dimensional co-centroid placement must
be even, DUMMY capacitors are placed at the co-centroid position of C0 and positioned
at the center of the array to enhance the overall matching of the capacitor array.
Fig. 6. 8-bit binary weighted CDAC $16\times16$ placement.
Algorithm 1: Capacitor array placement generation algorithm .
The pseudo-code for capacitor array placement generation is shown in Algorithm 1.
The placement generation algorithm first divides all capacitor bits into low bits,
which are placed in the two central columns, and high bits, which are arranged in
columns from the center outward. The two central columns follow the principle of placing
the lowest bit in the center and progressively higher bits closer to the edges, with
a co-centroid placement used from the center to the edges. The remaining columns are
arranged from the center outward, with the remaining bits arranged in increasing order
from small to large. Additionally, a column of the highest-bit capacitors is inserted
between every two adjacent columns to ensure that high-bit capacitors are adjacent
to capacitors of different bits in the horizontal direction.
IV. IMPLEMENTATION OF THE DETAILED ROUTING ALGORITHM FOR CDAC
The previous chapter described and analyzed the design problem of the capacitor array
placement and proposed a placement scheme in which high-bit capacitors are staggered
by column. The research goal of this chapter is to design a reasonable detailed routing
algorithm based on this, ensuring that the height matching of the capacitors is maintained
after adding specific metal lines to each capacitor, in order to ensure the high-precision
implementation of the capacitor array.
1. CDAC Bottom Plate Routing Method
Reviewing the content of Section II.2, the parasitic capacitance between the top plate
and the bottom plate can significantly affect the accuracy of the CDAC. The traditional
wiring method next to the capacitors usually requires longer connections, which introduces
larger parasitic capacitance and resistance, affecting signal transmission speed and
further impacting the matching of the capacitors. At the same time, wiring next to
the capacitors requires metal lines to bypass the capacitors, occupying additional
chip area and affecting the compactness of the array. In contrast, using the metal
layer beneath the capacitors for routing while using higher-level metal for the capacitors
themselves allows for vertical space reuse, greatly saving the area of the capacitor
array. The shortened routing length reduces the impact of parasitic parameters, and
the presence of the capacitor bottom plate further reduces the parasitic effects between
the routing and the top plate, making it easier to achieve capacitor matching. Additionally,
routing beneath the capacitors ensures that the physical environment around each unit
capacitor is the same, reducing the impact of mismatch and parasitic effects. Therefore,
this paper chooses to route the bottom plate beneath the capacitors.
Considering that the unit capacitor count in a binary-weighted capacitor array is
large and the overall layout area is substantial, this paper chooses to route all
bottom plate wires vertically to the very bottom of the entire array before making
the connections, in order to save space for horizontal routing channels and reduce
the overall array area. In integrated circuit design, capacitor arrays typically use
a layered layout method with horizontal and vertical lines, to avoid crossing and
unnecessary routing, reducing routing complexity, optimizing array area utilization,
and minimizing the impact of parasitic effects. In summary, this paper uses Metal4
and Metal3 as the routing layers for the vertical and horizontal lines of the capacitor
bottom plate, respectively.
This paper uses the metal layer beneath the capacitors for routing, with vias ensuring
the connectivity between the metal lines and the capacitors. In the case where there
are multiple vertical routing lines beneath the capacitor, placing the metal line
at the center of the capacitor ensures that the parasitic effects are more evenly
distributed across both ends of the capacitor. Considering that longer lines generally
have larger parasitic coupling, this paper places the longer lines at the center of
the capacitor, while shorter lines are placed closer to the edges. The bottom routing
structure of the DUMMY capacitors is the same as that of the actual working capacitors,
ensuring that the impact of the DUMMY capacitors on the surrounding environment is
the same as that of the internal capacitors, and ensuring that the environment around
the actual working capacitors near the edges is the same as that of the internal capacitors.
The bottom plate of the DUMMY capacitors is uniformly grounded, ensuring that all
DUMMY capacitors form the same parasitic effects and have a consistent impact on the
surrounding environment, while also forming a good shielding layer to prevent external
noise interference. The specific routing implementation pseudocode is shown in Algorithm
2. Taking an 8-bit CDAC array as an example, the routing result of the bottom plate
is shown in Fig. 7, where "D" represents the DUMMY capacitor.
Fig. 7. Layout diagram of capacitor array bottom plate routing.
Algorithm 2: Detailed routing algorithm for capacitor array.
2. CDAC Top Plate Routing Method
For the top plate routing, this paper uses Metal6 to route horizontally at the top
plate of each row of capacitors and connects them at the left and right ends of the
array through vertical metal lines. In this case, the physical environment around
each unit capacitor is the same, and there is no intersection between the top plate
metal lines and the bottom plate metal lines. The top plates of the DUMMY capacitors
in the first and last rows are not connected to other capacitor top plates, in order
to prevent the additional parasitic effects of the edge capacitors. This paper grounds
their top plates uniformly to isolate external interference signals and prevent noise
from coupling into the working capacitor array. The schematic of the top plate routing
is shown in Fig. 8.
Fig. 8. Layout diagram of capacitor array top plate routing.
3. CDAC Shielding Layer Routing Method
Through experiments, it was found that even with the method of routing the bottom
plate with the metal layer beneath the capacitors to reduce the coupling between the
top plate and bottom plate routing, the parasitic capacitance between them still has
a certain impact. In this paper, a wider metal layer, which is on the same layer as
the bottom plate routing, is added as a shielding layer between adjacent capacitors.
This transforms the parasitic coupling between the bottom plate routing and the top
plate into the coupling between the bottom plate routing and the shielding layer metal,
further isolating the impact of the bottom plate routing on the capacitance value
and making it easier to achieve capacitor matching. The schematic of the shielding
layer routing is shown in Fig. 9. Taking a 12-bit CDAC with various sizes as an example, the ENOB before and after
adding the shielding layer is shown in Table 2.
Fig. 9. Layout diagram of shielding layer.
Table 2. 12-bit CDAC performancebefore and after adding shielding layer(`r' for row,`c'
for column).
|
Placement Size
(r×c)
|
No Shield
|
Add Shield
|
|
ENOB
|
DNL
|
INL
|
ENOB
|
DNL
|
INL
|
|
256×16
|
11.19
|
1.261
|
1.132
|
11.57
|
0.783
|
0.726
|
|
128×32
|
11.75
|
0.590
|
0.569
|
11.88
|
0.445
|
0.285
|
|
64×64
|
11.93
|
0.527
|
0.512
|
11.95
|
0.436
|
0.316
|
|
32×128
|
11.94
|
0.512
|
0.472
|
11.95
|
0.433
|
0.354
|
|
16×256
|
11.94
|
0.605
|
0.496
|
11.96
|
0.464
|
0.407
|
As mentioned in Section II.2, the parasitic effects between interconnects on the accuracy
of CDAC mainly include the parasitic capacitance between the top and bottom plates,
as well as the parasitic capacitance between the top and substrate. The top plate
of the capacitor in this article is wrapped by the bottom plate, so the parasitic
effect between the top plate and the bottom plate plays a major role, and the additional
parasitic effect introduced by the shielding layer is relatively small. From the data
in the table, it can also be seen that when the shielding layer is added to the layout,
its linearity performance is better than that without the shielding layer. From the
data in the summary table, it can be concluded that adding a shielding layer effectively
isolates the parasitic coupling between the capacitor top plate and bottom plate routing,
improving the effective bit resolution of the layout. Furthermore, the stronger the
parasitic effects between the top plate and bottom plate routing, the better the shielding
layer improves the accuracy of the array.
V. RESULTS
Through the placement and routing methods introduced in the previous two chapters,
this paper achieves the automatic generation of the CDAC capacitor array layout. Taking
an 8-bit binary-weighted CDAC as an example, post-simulation is performed on the generated
layout. Simulation results based on TSMCN65 process and the specific generated layout
is shown in Fig. 10.
Fig. 10. Layout of 8-bit capacitor array.
The layout parasitic extraction (PEX) results are shown in Table 3. Based on the data in the table, it can be concluded that the routing method in this
paper effectively controls the relative matching error of each capacitor, suppresses
the increase in mismatch of high-bit capacitors, and achieves high matching of capacitors
in the CDAC.
Table 3. 8-bit CDAC parasitic capacitance to top plate.
|
Bit
|
Parasitic Capacitance/fF
|
Relative Matching Error/%
|
|
0
|
10.0317
|
0
|
|
1
|
20.0633
|
0.0005
|
|
2
|
40.0873
|
0.0984
|
|
3
|
80.1747
|
0.0983
|
|
4
|
160.349
|
0.0985
|
|
5
|
321.013
|
0.0004
|
|
6
|
642.026
|
0.0004
|
|
7
|
1284.05
|
0.0006
|
To further evaluate the actual performance of the CDAC layout, a sine wave is passed
through an 8-bit ideal ADC to obtain parallel binary digital input for the CDAC, followed
by transient simulation. This article sets the amplitude of the input sine wave to
600 mV, the sampling frequency to 1MHz, the number of sampling points to 1024, and
selects a signal period of 47. Therefore, the frequency of the input sine wave is
(47/1024*1) MHz. The bias voltage of CDAC is 600 mV, and the effective number of
bits for the layout design is obtained to be 7.9650164 bits, which is close to the
ideal value of 8 bits. The specific simulation results are shown in Fig. 11.
Fig. 11. Simulation results of 8-bit capacitor array layout (a) transient simulation
waveform, and (b) result of performing FFT on transient simulation waveform, with
1024 FFT sampling points and using coherent sampling and rectangular window.
DNL and INL are both important indicators for demonstrating the linear characteristics
of CDAC. The DNL and INL curves of the 8-bit capacitor array are shown in Fig. 12. According to the data in the figure, the maximum absolute value in the DNL curve
is 0.024 LSB, which is much smaller than 0.5 LSB. This indicates that the actual step
size of the analog voltage output of the DAC array generated in this paper is very
close to the ideal step size when adjacent codewords are input, and the difference
is minimal. In the INL curve, the maximum absolute value is 0.031 LSB, which is also
much smaller than 0.5 LSB, indicating that the overall conversion curve of the DAC
is close to the ideal conversion line, ensuring high linearity throughout the entire
range.
Fig. 12. DNL and INL of 8-bit capacitor array layout.
In addition, according to Fig. 11(a), it can be observed that when this CDAC structure is implemented in the top plate
sampling SAR ADC, the input range will be reduced. Due to the inclusion of many DUMMY
capacitors in the automatically generated capacitor array in this article, the actual
voltage division relationship may deviate from the ideal state, and the actual output
voltage may be lower than the ideal value, resulting in the following output voltage
relationship.
Among them, $V_{ref}$ is the reference voltage, which is 600mV in this article. $C_{total}$
represents the actual working capacitance, and $C_{dummy}$ is the DUMMY capacitor
that needs to be considered, which is the sum of DUMMY connected to the top plate
of the actual working capacitance. Therefore, if it is necessary to reduce the loss
of input range, increasing the bias voltage is sufficient.
In order to accurately evaluate the practicality and superiority of the algorithm
proposed in this paper, the layout performance was compared with other literature,
and the comparison results are shown in Table 4. According to the data in the table, it can be concluded that this article outperforms
manually drawn layouts in terms of DNL, INL, and area, and requires more than 12 hours
of design time compared to manual layouts [18]. This article only takes 0.85 seconds to achieve automatic generation of layout design.
Compared with other literature generated layouts, the layout generated by the algorithm
in this paper has advantages in DNL and INL, indicating that the automatically generated
capacitor array in this paper has higher matching degree and higher linearity of the
circuit. However, from the data in the table, it can also be seen that although the
design in this article has improved in terms of area compared to manual design, it
has significant disadvantages compared to algorithms in other literature. Therefore,
in terms of reducing the design area, further improvement is still needed for the
algorithm in this article.
In the previous experiments, the effectiveness of the detailed routing algorithm in
an 8-bit 16?16 placement capacitor array has been demonstrated. To further verify
the generality of the algorithm, this paper validates the algorithm on capacitor arrays
of various sizes for 8-13 bits. The specific simulation results are shown in Table 5. According to the data in the table, the detailed routing algorithm in this paper
can achieve high capacitor matching in various bit-sized CDAC placements. It effectively
suppresses the impact of interconnect parasitics on the capacitor top plate, achieving
the goal of high-precision automatic generation of capacitor array layouts. This demonstrates
the robustness and practicality of the algorithm in CDAC design.
Table 4. Comparison of layout performance.
|
Source
|
this paper(5.12f)
|
this paper (9.98f)
|
[3]
|
[14]
|
[18]
|
[18]
(manual)
|
|
DNL(LSB)
|
0.042
|
0.024
|
0.05
|
0.02
|
0.246
|
0.246
|
|
INL(LSB)
|
0.043
|
0.031
|
0.494
|
0.07
|
0.230
|
0.292
|
|
Area(um2)
|
29609
|
54543
|
14997
|
2541
|
53230
|
58397
|
Table 5. Linear characteristic of 8-13 bit capacitor arrays.
|
RES
|
Placement Size
(row×col)
|
DNL
/LSB
|
INL
/LSB
|
ENOB
/bits
|
|
8bits
|
16×16
|
0.024
|
0.031
|
7.96
|
|
32×8
|
0.095
|
0.080
|
7.96
|
|
8×32
|
0.013
|
0.014
|
7.97
|
|
9bits
|
16×32
|
0.046
|
0.043
|
8.95
|
|
32×16
|
0.061
|
0.069
|
8.95
|
|
8×64
|
0.035
|
0.038
|
8.96
|
|
10bits
|
32×32
|
0.148
|
0.110
|
9.91
|
|
16×64
|
0.145
|
0.121
|
9.92
|
|
64×16
|
0.164
|
0.153
|
9.87
|
|
11bits
|
32×64
|
0.283
|
0.227
|
10.96
|
|
64×32
|
0.291
|
0.210
|
10.94
|
|
16×128
|
0.278
|
0.237
|
10.96
|
|
12bits
|
64×64
|
0.436
|
0.316
|
11.95
|
|
32×128
|
0.433
|
0.354
|
11.95
|
|
128×32
|
0.445
|
0.285
|
11.88
|
|
13bits
|
64×128
|
0.811
|
0.830
|
12.97
|
|
128×64
|
0.910
|
0.880
|
12.93
|
|
32×256
|
0.749
|
0.801
|
12.93
|
As the bit number increases, the number of capacitors rises exponentially. Manually
generating the CDAC layout is not only inefficient but also prone to errors. The automatic
placement and routing algorithm in this paper provides the layout generation time
for capacitor arrays of various bit sizes, as shown in Table 6. According to the data in the table, it can be concluded that this algorithm significantly
reduces the design time for capacitor array layouts, effectively improving both design
efficiency and quality.
Table 6. Layout generation time for 8-13 bit capacitor arrays.
|
Bit Resolution Of CDAC
|
Layout Generation Time
|
|
8bits
|
0.85s
|
|
9bits
|
1.38s
|
|
10bits
|
2.27s
|
|
11bits
|
4.33s
|
|
12bits
|
7.51s
|
|
13bits
|
14.26s
|
VI. CONCLUSION
This paper outlines the research background and emphasizes the importance of automatic
capacitor array layout generation in SAR ADC design. The study then focuses on the
high capacitor matching in CDACs, discussing how to reduce the impact of interconnect
parasitic effects on layout accuracy. An in-depth analysis and study of the specific
automatic placement and routing methods for the layout were conducted. Experimental
results show that the capacitor array layout generation algorithm in this paper achieves
an effective number of bits close to the ideal value in 8-13-bit CDAC designs, with
a generation time much shorter than manual design, realizing high-efficiency and high-precision
automatic layout generation.
However, this study also has certain limitations. First, the unit capacitor values
selected in this paper are relatively large, which results in larger individual capacitor
areas. Additionally, the CDAC in this paper uses a binary-weighted structure, causing
the number of unit capacitors to increase exponentially with the bit number. This
situation leads to a large area occupation for the capacitor array layout, which is
unfavorable for integration and cost control. Secondly, based on the experimental
results, it can be observed that as the number of rows in the capacitor array placement
increases, the effective number of bits in the generated layout decreases. When the
number of rows increases, capacitors of more bits are placed in the middle two columns,
and the parasitic coupling between their bottom plates affects the matching, thus
deteriorating the simulation results. Therefore, the placement method in this paper
has limitations for placements with a large number of rows. These limitations suggest
that future research should focus on the use of smaller capacitors and the adjustment
of the positioning relationships of low-bit capacitors to obtain more comprehensive
and accurate conclusions.
In summary, this paper achieves the automatic generation of capacitor array layouts
with high matching, and the effective number of bits is close to the ideal value,
meeting the target requirements. Although there are certain limitations, these findings
provide valuable insights for the development of high-precision capacitor array implementations.
Future research can further expand on capacitor sizing and the placement of low-bit
capacitors to improve the general applicability.
ACKNOWLEDGMENTS
This work was supported by Laboratory Specialized Scientific Research Projects
of Beijing Smartchip Microelectronics Technology Co. Ltd under Grant number SGSC0000YFOT2401365.
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Wenjie Yang received his B.S. degree from Jinan University, Guangdong, China, in
2025. He is currently a first-year graduate student at Sun Yat-sen University. His
research interests include EDA technology for analog integrated circuits, with a particular
focus on analog integrated circuit layout and routing.
Yanning Chen received her B.S. degree in computer science from Capital Normal University
in 2002 and received an M.S. degree in electronic and communication engineering from
Beijing University of Posts and Telecommunications in 2018. She is senior engineer,
director of Research and Development center, Beijing Smartchip Microelectronics Technology
Co., Ltd. She has significantly contributed to industrial chip reliability by addressing
key technical challenges, developing technical standards, and establishing a quality
assurance system for industrial chips.
Dong Zhang received his B.S degree in applied physics from Lanzhou University of
Technology, LanZhou, China, in 2008. He then worked at RFMD (Beijing), where he was
engaged in IC testing, reliability and failure analysis.In 2011, he joined Beijing
Smartchip Microelectronics Technology Co., Ltd. and is responsible for analog IC automated
design related work. His current research interests include analog circuit sizing
and layout automation.
Fang Liu received her Ph.D. degree in Tianjin University, Tianjin, China in 2010.
In 2015, she joined Beijing Smartchip Microelectronics Technology Co. Ltd., Beijing,
China. Her current research interests include reliability of integrated circuit and
semiconductor devices.
Yang Zhao is Senior Engineer, manager of R&D Department of Beijing Smart-Chip Microelectronics
Technology Co., LTD. He has long been engaged in the technical work of industrial
chip testing and verification. He has more than 10 years of technical experience in
the fields of IC-EMC, IC failure analysis and reliability. He is mainly responsible
for the monitoring and analysis of the electric power field environment and the formulation
of the related technical standards for the chips used in the electric power terminal.
He has participated in the formulation /revision standard for more than 10 items,
published 6 articles and 13 patents.
Fang Ni received his B.S. degree in materials science and engineering from Beijing
Institute of Technology in 2005, and received an M.S. degree in materials science
from the same university in 2007. She is currently a Senior Advanced Technology Research
Engineer at the Research and Development Center of Beijing Smart-Chip Microelectronics
Technology Co., Ltd. She has long been engaged in the technical work of industrial
chip testing and verification, and has more than 15 years of technical experience
in the fields of integrated circuit failure analysis and reliability.
Songchao Zhu received his M.S. degree in communication and information systems
from NWPU in 2006. He then worked at Huawei for over a decade, where he was responsible
for the design and application of communication chips. In 2019, he joined Beijing
Smartchip Microelectronics Technology Co., Ltd. His current research interests include
chip reliability, integrated circuit design, manufacturing, and EDA technology research.
Xiangyu Meng received his B.Sc. and Ph.D. degrees in electrical engineering from
Tsinghua University, Beijing, China, in 2011 and 2017, respectively. From 2017 to
2018, he was a Post-Doctoral Fellow with the Electronic and Computer Engineering,
Hong Kong University of Science and Technology, Hong Kong. He is currently an Associate
Professor with the School of Electronics and Information Technology, Sun Yat-sen University,
Guangzhou, China. His research interests include Analog and RF IC design automation.