I. INTRODUCTION
Micro light-emitting-diodes (Micro-LEDs), as a next-generation display technology,
is rapidly advancing and attracting widespread attention. This technology utilizes
micron-scale light-emitting-diodes (LEDs) as light-emitting pixel units, forming images
through densely arranged LED arrays. It offers significant advantages in resolution,
response speed, brightness, and service life. Micro-LED demonstrates tremendous application
potential in fields such as Augmented Reality and Virtual Reality (AR/VR) and near-eye
displays, automotive displays and smart lighting, as well as wearable devices [1,
2].
Unlike traditional display technologies, Micro-LED directly integrates LED chips smaller
than 100 micrometers onto a driving substrate to form a self-emissive display structure
[3]. In terms of optical performance, its single-pixel brightness can reach tens of thousands
of nits, enabling excellent visibility even in high ambient light conditions [4]. In dynamic display scenarios, Micro-LED's response speed far exceeds that of traditional
technologies like liquid crystal display (LCD), allowing it to clearly render image
details even at high refresh rates [5].
However, full-color Micro-LED display technology still faces numerous technical challenges.
Since red Micro-LEDs require different epitaxial growth materials compared to blue
and green Micro-LEDs, integrating red, green, and blue epitaxial layers on the same
substrate is extremely difficult. The continued shrinkage of Micro-LEDs to achieve
higher pixel densities means that even minor defects can significantly impact their
subsequent light-emitting performance [6,
7].
To achieve full-color display, massive transfer technology is essential. This involves
efficiently and precisely transferring millions or even tens of millions of Micro-LED
chips—each emitting only a single color (red, green, or blue)—from their respective
growth substrates to a driving substrate. It also requires ensuring reliable electrical
connections between these chips and the driving circuits to construct a high-density,
high-precision display array [8]. This process involves the transfer of hundreds of thousands to tens of millions
of Micro-LED chips, placing extremely high demands on the number of transfers, speed
(millions per hour), precision, process yield (> 99.99999%), stability, and cost control.
Existing massive transfer technologies—such as stamp printing [9], laser transfer [10], and fluidic self-assembly [11]—each exhibit notable limitations in practice. Stamping technology struggles with
stamp adhesion control, resulting in yields that fail to meet mass production requirements.
Laser transfer generates asymmetric shockwaves that affect placement accuracy, and
uneven energy control can cause irreversible thermal damage to the chips. Fluidic
self-assembly has difficulty achieving high-density, tightly packed arrangements,
limiting its applicability in high-resolution displays [12].
Blue Micro-LEDs combined with a quantum dot (QD) color conversion layer can efficiently
convert a portion of the blue light into red and green light, thereby enabling full-color
display [13]. By precisely controlling the size and composition of the quantum dots, light at
different wavelengths can be emitted, covering a wider color gamut. In micro-display
applications such as AR/VR, this technology helps high-pixel-density panels achieve
more accurate red and green colors and more natural color transitions. However, the
technology still faces challenges: it is difficult to synthesize high-quality quantum
dots with stable and uniform optical properties, and the mainstream synthesis methods
remain time-consuming, costly batch processes. These issues represent key challenges
to achieving its widespread application [14-
16].
Additionally, in terms of performance, there are significant differences in light-emitting
efficiency among red, green, and blue Micro-LEDs, particularly with the quantum efficiency
of red and green being notably lower than that of blue [17]. These key technical bottlenecks severely hinder the commercialization of Micro-LED
display products.
Another type of solid-state semiconductor light source, the organic light-emitting
diode (OLED), is an organic light-emitting technology composed of multiple functional
thin-film layers [18]. OLEDs achieve high brightness, high efficiency, and high contrast without requiring
a backlight, while also offering wide viewing angles, fast response times, and excellent
color accuracy [19]. Thanks to these advantages, OLEDs have become the preferred choice for modern display
devices such as high-end smartphones and ultra-thin TVs, and they also show great
potential in emerging markets like automotive displays and wearable devices [20].
Currently, red and green phosphorescent materials in OLED technology have achieved
stable commercial applications, with external quantum efficiencies exceeding 35%,
demonstrating outstanding light-emitting performance. However, blue phosphorescent
materials still lag behind in overall performance, especially in terms of lifetime
and efficiency [21,
22]. Due to the shorter wavelength of blue light, which corresponds to higher photon
energy, the organic materials in blue OLEDs must withstand greater energy, leading
to reduced material stability, accelerated aging, and shorter operational lifespans.
Achieving efficient, high-color-purity emission in the blue wavelength range is particularly
challenging, and such devices also exhibit significantly shorter operational lifetimes
compared to other types of materials [23]. These performance shortcomings of blue OLEDs negatively impact the overall quality
of full-color displays.
This study aims to overcome the current technical bottlenecks in full-color display
solutions for both Micro-LED and OLED. Based on existing fabrication processes, We
innovatively leverage the commonalities in light-emission mechanisms and device architectures
between Micro-LEDs and OLEDs. We propose a novel passive-driven full-color display
solution: integrating blue Micro-LED subpixels with red and green OLED subpixels on
the same substrate. This approach eliminates the need to separately transfer red,
green, and blue pixels from their individual growth substrates to a common driving
substrate, thereby simplifying the manufacturing process and significantly reducing
costs. Furthermore, this design capitalizes on the high light-emission efficiency
of blue Micro-LEDs and the superior stability of red and green OLEDs, providing a
new technological pathway for the development of full-color display devices.
II. EXPERIMENT
A GaN-based blue multiple quantum well (MQW) LED epitaxial wafer grown on a 4-inch
sapphire substrate was used to fabricate the Micro-LED array, with designated evaporation
areas (sizes: 70 $\times$ 90 $\mu$m$^2$ and 50 $\times$ 70 $\mu$m$^2$) reserved for
the deposition of red and green OLEDs. On this epitaxial wafer, two blue Micro-LED
arrays of different sizes were fabricated on the same epitaxial wafer, one featuring
20 $\times$ 70 $\mu$m$^2$ pixels in an 8 $\times$ 16 array, and the other featuring
40 $\times$ 90 $\mu$m$^2$ pixels in a 16 $\times$ 18 array.
Fig. 1. Schematics of the pixel array atructure.
We successfully fabricated passive matrix (PM) display devices using blue Micro-LEDs
with two different mesa sizes on a 4-inch blue epitaxial wafer. By integrating red,
green, and blue subpixels fabricated on the same substrate, we avoided the complexity
of massive transfer processes. Fig. 1 shows the structure of the designed circuit. Each subpixel consists of a blue Micro-LED
connected in reverse parallel with a green OLED, along with an independently connected
red OLED of the same polarity. After completing the fabrication of the Micro-LED passive
matrix devices, Pre-alignment and precise alignment calculations were performed to
define the evaporation areas for red and green OLEDs prior to the fine metal mask
(FMM) process Subsequent device debugging further ensured alignment accuracy, after
which we completed the multi-layer evaporation process for the red and green OLEDs.
Ultimately, we achieved the integrated array of blue Micro-LEDs and red and green
OLEDs on the same substrate.
In addition, this paper provides a systematic analysis and study of the photoelectric
performance of the two different sizes of blue Micro-LEDs and the red and green OLEDs
that were fabricated, laying the foundation for future optimization and application.
Fig. 2. Fabrication process flow of the Micro-LED device. (a) Wafer, (b) mesa and
ISO etching, (c) sputtering of ITO, (d)fabrication of column electrodes, (e) SiO$_2$
deposition, and (f) fabrication of row electrodes.
Fig. 2 illustrates the manufacturing process flow for the Micro-LED device. Inductively
coupled plasma (ICP) etching technology was employed to create isolation trenches
with a depth of 5 $\mu$m on the epitaxial wafer, achieving electrical isolation between
individual pixels. Subsequently, a 75-nm-thick indium tin oxide (ITO) transparent
conductive layer was deposited on the sample surface via magnetron sputtering, serving
as the anode material for the red and green organic light-emitting diodes (OLEDs).
The ITO regions exposed by photolithography and development, were selectively etched
using an ITO etchant to form the electrode patterns on both the mesa structures and
the OLED deposition areas. The n-type electrodes, with a total thickness of approximately
2 $\mu$m and composed of a multilayer structure (Cr/AlCu/Ti/Pt/Au/Ti), were fabricated
using electron beam evaporation. To effectively prevent short circuits caused by intersecting
row and column electrodes, and to avoid potential shorting of the light-emitting regions
due to environmental contaminants such as moisture and dust, a silicon dioxide (SiO$_2$)
insulating layer was deposited on the sample surface via plasma-enhanced chemical
vapor deposition (PECVD). Following insulation layer deposition, ICP etching was used
to open the p-electrode contact windows as well as the evaporation areas for the red
and green OLEDs. Finally, the p-type electrodes, consisting of the same materials
and deposited in the same sequence of thicknesses as the n-type electrodes, were fabricated
via electron beam evaporation. These p-type electrodes were then interconnected with
a flexible printed circuit (FPC).
Through the above fabrication steps, the passive matrix (PM) Micro-LED display array
was successfully fabricated. This process achieved pixel isolation and established
the electrode interconnection structure required for array-based display devices.
The PM (passive matrix) device designed in this study integrates Micro-LEDs and OLEDs
in a hybrid configuration, with its pixel array arranged in a repeating RBGGBR sequence.
As a result, the vacuum deposition of the red and green OLEDs requires precise alignment.
Given that the prepared Micro-LED epitaxial wafer is 4-inche in size, while the laboratory's
existing evaporation equipment is designed for 8-inch substrates, a specialized adapter
plate was specially designed to securely hold the 4-inch epitaxial wafer.
Using the entire 4-inch blue Micro-LED epitaxial wafer as the substrate, an ITO (indium
tin oxide) thin film was deposited to serve as the anode. Subsequently, the various
organic layer structures were constructed via the evaporation process, ultimately
completing the fabrication of the OLED devices.
Prior to evaporation, the epitaxial wafer underwent a series of surface treatments
to ensure optimal deposition conditions. The procedure was as follows: A four-step
cleaning process was employed, sequentially using deionized water rinsing to remove
physical adsorbates, a five-minute acetone immersion to eliminate chemical residues,
isopropyl alcohol cleaning, and nitrogen blow-drying. Following surface pretreatment,
the sample was placed in a nitrogen-filled oven and baked at 120 $^\circ$C for one
hour, a step specifically designed to effectively remove both surface-adsorbed and
internally trapped moisture. Through the above treatments, the surface morphology
and chemical state of the epitaxial wafer were significantly improved.
Subsequently, the treated epitaxial wafer was mounted onto the 4-inch wafer adapter
plate and covered with an 8-inch evaporation substrate. Manual pre-alignment was then
performed using a microscope to ensure that the metal shadow mask was accurately aligned
with the red and green OLED deposition regions. The positional information of the
mask at this stage was carefully recorded.
After pre-alignment, the assembled 8-inch evaporation substrate was loaded into the
CIC evaporator. Based on the previously recorded manual pre-alignment data regarding
the mask position, multiple realignment procedures and compensation calculations were
carried out until precise alignment was achieved.
After alignment, the functional layers were sequentially deposited as illustrated
in Fig. 3. The blue Micro-LED structure began with the deposition of a 75-nm-thick ITO anode
layer. This was followed by a 5-nm-thick HAT-CN(1,4,5,8,9,11-hexaazatriphenylene hexacarbonitrile)
layer as the hole injection layer (HIL) and a 50-nm-thick NPB(N,N'-di(naphthalen-1-yl)-N,N'-diphenyl-benzidine)
layer as the hole transport layer (HTL).For the red and green organic emitting layers,
a 40-nm-thick CBP(4,4'-bis(carbazol-9-yl)biphenyl) host material was used. The red
emitting layer was doped with 16% AT5441 dye, while the green emitting layer was doped
with 10% Ir(ppy)$_3$(tris(2-phenylpyridine) iridium) complex. Subsequently, a 20-nm-thick
TmPyPB(1,3,5-tris(N-phenylbenzimidazol-2-yl)benzene) electron transport layer and
a 1-nm-thick LiF electron injection layer were deposited. Finally, a 100-nm-thick
aluminum cathode layer was thermally evaporated to complete the device structure.
Fig. 3. Evaporation process flow for red and green OLEDs (a) green OLED evaporation
(b) red OLED evaporation.
After the evaporation process was completed, the samples were transferred to an inert
atmosphere glove box integrated with the evaporation system. Using a spin coater,
an epoxy-based ultraviolet (UV) curable adhesive was uniformly applied along the predefined
encapsulation boundary of the OLED device and the bonding area of the glass cover
plate at a constant speed. A 22 mm $\times$ 22 mm glass cover plate was then placed
over the device. Upon exposure to UV light, the adhesive layer underwent cross-linking
and curing, achieving a robust bond between the substrate and the cover plate. This
glass cover plate functions as an encapsulation barrier, forming a highly hermetic
protective structure that effectively blocks the penetration of moisture and oxygen.
This significantly enhances the environmental stability of the device and extends
its operational lifetime.
Following the encapsulation process, the chip electrodes were electrically connected
to a pre-fabricated driver circuit board via a flexible printed circuit (FPC). This
interconnection was achieved using micron-sized conductive particles, ensuring reliable
vertical (Z-direction) electrical conduction between the chip and the substrate electrodes.
Subsequently, the device was subjected to performance testing to evaluate its electrical
and optical characteristics. Fig. 4 displays the blue Micro-LED and the red and green OLEDs being driven.
Fig. 4. (a) blue Micro-LED (powered at 2.7V) and (b) red and green OLED (powered at
5V).
III. RESULTS AND DISCUSSION
This study conducted photoelectric characteristic testing and data acquisition on
individually tested modules of the blue Micro-LED and red/green OLEDs fabricated within
the hybrid device, using a multifunctional integrated light-emitting device testing
system (D3000-16CH). The testing system consists of a DC power supply unit, a TOPCON
integrated spectrometer (SR-3A), and a computer, enabling efficient and accurate measurement
of the optoelectronic performance of display devices.
As shown in Fig. 5(a), the I–V characteristic curves of the two blue Micro-LEDs with different mesa sizes
exhibit typical PN junction behavior. Both devices have a turn-on voltage of 2.7 V.
After turn-on, the current increases exponentially with voltage. Due to the larger
active area, the device with a mesa size of 40 $\times$ 90 $\mu$m$^2$ consistently
shows a higher current than the 20 $\times$ 70 $\mu$m$^2$ device under the same bias
voltage.
As illustrated in Fig. 5(b) and Fig. 5(c), which present the J–V and L–V characteristic curves respectively, under the same
voltage after turn-on, the larger-sized Micro-LED experiences current crowding effects.
This leads to intense localized heating in the small region beneath the electrodes,
forming a local hot spot that results in efficiency degradation. In contrast, the
smaller-sized Micro-LED demonstrates better current spreading capability and enhanced
heat dissipation. Consequently, the 20 $\times$ 70 $\mu$m$^2$ Micro-LED can sustain
a higher current density and deliver greater optical power density. The 40 $\times$
90 $\mu$m$^2$ Micro-LED, with its larger light-emitting mesa area, achieves a luminous
intensity of 3.69 $\times$ 10$^4$ cd/m$^2$ at 4.5 V, which is higher than the 3.08
$\times$ 10$^4$ cd/m$^2$ emitted by the 20 $\times$ 70 $\mu$m$^2$ Micro-LED at the
same voltage.
Fig. 5. (a) I–V characteristic curves of 20 $\times$ 70 $\mu$m$^2$ and 40 $\times$
90 $\mu$m$^2$ blue Micro-LEDs. (b) J–V characteristic curves of 20 $\times$ 70 $\mu$m$^2$
and 40 $\times$ 90 $\mu$m$^2$ blue Micro-LEDs. (c) L–V characteristic curves of 20
$\times$ 70 $\mu$m$^2$ and 40 $\times$ 90 $\mu$m$^2$ blue Micro-LEDs. (d) J–L characteristic
curves of 20 $\times$ 70 $\mu$m$^2$ and 40 $\times$ 90 $\mu$m$^2$ blue Micro-LEDs.
(e) The M.P.–V (Main peak–Voltage) characteristic curves. (f) Emission spectra of
blue Micro-LEDs at different voltages.
As shown in Fig. 5(e), the peak emission wavelength of the blue Micro-LED varies between 455 nm and 449
nm under different voltages. As the voltage increases from 2.5 V to 4.5 V, the peak
wavelength of the blue Micro-LED decreases, exhibiting a certain degree of blue shift.
This phenomenon primarily occurs because, as the bias voltage rises, the energy of
the emitted photons increases, causing the corresponding peak wavelength to shift
toward shorter wavelengths.
After testing the two sizes of blue Micro-LEDs, we proceeded to evaluate the optoelectronic
performance of the red and green OLEDs.
The I–V characteristic curves of the red and green OLEDs with two different mesa sizes
are shown in Fig. 6(a) and Fig. 7(a), respectively. Both I–V curves exhibit typical PN junction behavior, with turn-on
voltages of 3 V for both red and green OLEDs—values that are close to the 2.7 V turn-on
voltage of the blue Micro-LEDs. This similarity allows them to be controlled using
the same driving circuit. After turn-on, the current of both red and green OLEDs increases
exponentially with voltage. Due to differences in active area, under the same bias
voltage, the device with a mesa size of 70 $\times$ 90 $\mu$m$^2$ consistently shows
a higher current than the 50 $\times$ 70 $\mu$m$^2$ device.
Fig. 6. (a) I–V characteristic curves of 50 $\times$ 70 $\mu$m$^2$ and 70 $\times$
90 $\mu$m$^2$ red OLEDs. (b) J–V characteristic curves of 50 $\times$ 70 $\mu$m$^2$
and 70 $\times$ 90 $\mu$m$^2$ red OLEDs. (c) L–V characteristic curves of 50 $\times$
70 $\mu$m$^2$ and 70 $\times$ 90 $\mu$m$^2$ red OLEDs. (d) J–L characteristic curves
of 50 $\times$ 70 $\mu$m$^2$ and 70 $\times$ 90 $\mu$m$^2$ red OLEDs. (e) The M.P.–V
characteristic curves. (f) Emission spectra of red OLEDs at different voltages.
By analyzing Fig. 6 and Fig. 7, it can be seen that: the following results were obtained: at 5 V, the 50 $\times$
70 $\mu$m$^2$ green OLED achieves a luminance of 87.37 cd/m$^2$ (with a current density
of 351 mA/cm$^2$), while the 70 $\times$ 90 $\mu$m$^2$ green OLED reaches a luminance
of 100.13 cd/m$^2$ (with a current density of 253 mA/cm$^2$). During the same period,
the 50 $\times$ 70 $\mu$m$^2$ red OLED exhibits a luminance of 18 cd/m$^2$ (current
density: 56 mA/cm$^2$), and the 70 $\times$ 90 $\mu$m$^2$ red OLED reaches 28.1 cd/m$^2$
(current density: 40 mA/cm$^2$). These data indicate that the green OLEDs demonstrate
significantly higher luminance and current density than the red OLEDs.
Fig. 7. (a) I–V characteristic curves of 50 $\times$ 70 $\mu$m$^2$ and 70 $\times$
90 $\mu$m$^2$ green OLEDs. (b) J–V characteristic curves of 50 $\times$ 70 $\mu$m$^2$
and 70 $\times$ 90 $\mu$m$^2$ green OLEDs. (c) L–V characteristic curves of 50 $\times$
70 $\mu$m$^2$ and 70 $\times$ 90 $\mu$m$^2$ green OLEDs. (d) J–L characteristic curves
of 50 $\times$ 70 $\mu$m$^2$ and 70 $\times$ 90 $\mu$m$^2$ green OLEDs. (e) The M.P.–V
characteristic curves. (f) Emission spectra of green OLEDs at different voltages.
The smaller-sized OLEDs (50 $\times$ 70 $\mu$m$^2$) exhibit better current spreading
capability and stronger heat dissipation performance. Similar to the smaller blue
Micro-LEDs, they can sustain higher current densities and deliver greater optical
power density. Additionally, as shown in Fig. 6(e) and Fig. 7(e), when the voltage increases from 3 V to 5 V, the peak emission wavelength of the
green OLEDs ranges from 512 nm to 514 nm, while the red OLEDs maintain a stable peak
wavelength between 608 nm and 611 nm.
Fig. 8 illustrates the evolution of the spectral characteristics of red/green OLEDs and
blue Micro-LEDs based on the CIE 1931 chromaticity space. For red/green OLEDs, the
variation of chromaticity coordinates with increasing voltage exhibits distinct stage-dependent
behavior: at low voltages, dynamic changes in charge balance occur [24]—under low-voltage conditions, hole injection dominates, shifting the recombination
zone toward the electron transport layer (ETL) side, where red/green guest materials
are more efficiently excited (due to their higher excitation efficiency in this region),
thereby altering the spectral weight distribution. As the voltage increases, electron
injection gradually strengthens, leading to a reconstruction of exciton distribution
[25]; the recombination zone shifts back toward the center of the emissive layer, and
the excitation efficiency of the guest materials adjusts accordingly, causing a rebalancing
of the spectral weights. When the voltage enters the high-voltage range, Joule heating
(P = I$^2$R) accumulates, raising the device temperature. On one hand, the bandgap
of the organic material contracts due to thermal expansion and intensified lattice
vibrations, potentially inducing spectral shifts; on the other hand, elevated temperatures
enhance Auger recombination and nonradiative recombination processes, reducing luminous
efficiency and thereby changing the relative proportion of short-wavelength components
in the spectrum. In sharp contrast, the chromaticity coordinates of the blue Micro-LED
exhibit a continuously changing trend with increasing voltage. The primary reason
lies in the enhanced quantum-confined Stark effect (QCSE) [26] or band-filling effect caused by increased injection current—both factors reduce
the overlap between electron and hole wavefunctions, ultimately resulting in a significant
shift of the peak wavelength.
Fig. 8. CIE 1931 chromaticity coordinates of the blue Micro-LED, red OLED, and green
OLED.
From (d) results in Figs. 5, 6, and 7, it can be observed that the emission wavelength fluctuations of red/green OLEDs
are all less than 3 nm, whereas during the increase of driving voltage from 2.7 V
to 4.5 V, the peak emission wavelength of the blue Micro-LED shifts from 455 nm to
449 nm (a blue shift), indicating a pronounced color deviation. This is mainly because,
over the same voltage variation range, the current density of the blue Micro-LED changes
by as much as six orders of magnitude (Fig. 5b), while that of the red/green OLEDs changes by only about two orders of magnitude
(Figs. 6 and 7(b)). It is worth noting that when the current densities of both the blue Micro-LED and
the red/green OLEDs change by two orders of magnitude, their wavelength variations
remain within 3 nm, which is consistent with the findings reported in reference [27].
Based on the above analysis, the red/green OLEDs and blue Micro-LEDs fabricated in
this work demonstrate good spectral stability and color reproducibility. However,
for the blue Micro-LED, subsequent implementation of voltage stabilization or color-point
compensation strategies in the driving circuit will be necessary to suppress the color
deviation caused by large variations in current density.
Meanwhile, we conducted lifetime tests on the fabricated devices. Under ambient conditions
of 22 $^\circ$C and 40% relative humidity (RH), red and green OLEDs were operated
under a constant voltage of 4 V, with the initial luminance defined as L0. The test
results showed that the luminance degradation trends of both types of devices were
highly similar and could be well fitted by a stretched exponential decay model [28].
According to calculations based on this model, the lifetimes of the red and green
OLEDs—defined as the time taken for the luminance to decay to 70% of its initial value
(0.7 L0)—were 45 h and 56 h, respectively (Fig. 9). In comparison, the blue Micro-LED, when driven at 4 V under the same environmental
conditions and continuously operated for 360 h, still maintained a luminance retention
rate above 70% (L360h > 0.70L0), demonstrating significantly superior long-term stability
compared to the red and green OLEDs.
Fig. 9. Lifetime of red and green OLEDs.
The limited lifetime of red and green OLEDs is primarily attributed to inadequate
encapsulation performance. The currently employed UV resin combined with a glass cover
encapsulation exhibits a water vapor transmission rate (WVTR) as high as 21 g/(m$^2\cdot$day),
far exceeding the industrial standard for OLED packaging (typically < 10$^{-6}$ g/(m$^2\cdot$day)).
High permeation of moisture and oxygen accelerates the oxidation of organic materials
and interfacial degradation, which constitutes the key bottleneck restricting OLED
lifetime. The existing lifetime data reflect the performance limits under the current
encapsulation conditions rather than the intrinsic limits of the materials or device
structure itself. In the next step, we will focus on developing Al$_2$O$_3$/HfO$_2$
multilayer barrier film technology based on atomic layer deposition (ALD) [29], with the goal of reducing the WVTR to the order of 10$^{-6}$ g/(m$^2\cdot$day),
thereby significantly improving the environmental stability and operational lifetime
of OLEDs (as confirmed by literature [30], ALD has been proven effective in prolonging OLED lifetime).
IV. CONCLUSIONS
This study proposes a novel hybrid device suitable for passive matrix (PM) displays,
featuring the successful integration of GaN-based blue Micro-LEDs and red/green OLED
subpixels on a single substrate. The experimental results demonstrate that the turn-on
voltages of red and green OLEDs with different mesa sizes show minimal variation from
that of the blue Micro-LED, indicating that all three types of devices can be activated
using the same driving voltage. Notably, under a driving voltage of 4.5 V, the blue
Micro-LED achieves a luminance of up to 10$^4$ cd/m$^2$, significantly outperforming
the red and green OLED devices.
To meet the requirements of subsequent full-color display applications, we will address
the brightness mismatch between the blue Micro-LEDs and red/green OLEDs by adjusting
the driving duty cycles of the RGB subpixels, or by appropriately increasing the emission
area of the red/green OLEDs while correspondingly reducing the area of the blue Micro-LEDs,
based on their distinct luminescence characteristics. Meanwhile, future research will
focus on optimizing material systems, exploring resonant cavity structures, and enhancing
process stability, in order to bring the luminance of red/green OLEDs closer to that
of the blue Micro-LEDs, thereby achieving optimal display performance.
This study provides important theoretical foundations and practical guidance for the
development of high-performance driving and control strategies for RGB full-color
displays. Based on the existing experimental data, further improvements in device
structure can be pursued in the future to enhance display resolution, ultimately enabling
the practical realization of full-color displays using hybrid blue Micro-LED and red/green
OLED devices. This approach opens up a new technological pathway for full-color display
technology.
ACKNOMLEDGMENTS
This work was supported by National Natural Science Foundation of China (No. 12474066).
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Shengcheng Liu received his bachelor's degree in integrated circuit design and integrated
system from Fuzhou University in 2023 and is currently pursuing a master's degree
at the same institution. His primary research focuses on gallium nitride (GaN) Micro-LEDs
for next-generation display technology, as well as semiconductor materials and devices.
Jiawei Yuan is a master candidate. He is currently studying at Fuzhou University,
pursuing a degree in integrated circuit engineering. His core research focus is on
Micro-LED process research, mainly conducting research on key links such as Micro-LED
device fabrication, process optimization and performance improvement.
Qian Liu is a doctoral candidate. She is currently pursuing a Ph.D. degree in electronic
science and technology (academic program) at Fuzhou University. Her core research
focus is on Micro-LED and OLED process research, primarily conducting work on key
aspects such as Micro-LED device fabrication, integration of Micro-LED and OLED hybrid
devices, process optimization, and performance enhancement.
Zhibing Yan received a Master of Engineering in integrated circuit engineering from
Fuzhou University. His research is centered on Micro-LED technology, encompassing
deposition processes and the hybrid integration of Micro-LED and OLED devices.
Tianxi Yang is affiliated with Fujian Science & Technology Innovation Laboratory for
Optoelectronic Information of China, Fuzhou 350100, China. His current research interests
focus on Micro-LEDs and their applications.
Jie Sun received his bachelor's and master's degrees from Dalian University of Technology,
and a Ph.D. degree from the Institute of Semiconductors (CAS) and Lund University,
followed by appointments as postdoc, assistant professor, and associate professor
at Chalmers University of Technology. Currently, he is a professor in Fuzhou University.
He has long been engaged in fundamental and applied research on semiconductor materials
and devices, as well as two-dimensional materials and their device applications.
Qun Yan received his Ph.D. degree in physics from Vanderbilt University in 1995. He
was selected as a state-level talent in 2009. He is currently a Distinguished Professor
in Fuzhou University and was elected as a Foreign Member of the Russian Academy of
Engineering in 2022. He is the President of the Society for Information Display (SID).
His research efforts are dedicated to the development of information display technologies,
novel materials, electronic and optical devices, as well as surface science.